The wafer is made with asilicon dioxide thermal oxide layer on a polished silicon wafer substrate. It can be used as aSiO2 silicon wafer ,silicon dioxide wafer ,thermal oxide wafer ,oxidized silicon wafer, orpolished semiconductor substrate for compatible laboratory and research projects.
SiO2 Thermal Oxide Silicon Wafer 2 4 6 Inch Silicon Dioxide Substrate
Research Use ：Can be used as SiO2 substrate, silicon dioxide wafer, oxidized silicon wafer, or lab sample wafer. The wafer is made with asilicon dioxide thermal oxide layer on a polished silicon wafer substrate.
