SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate
SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate

SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate

USD 98.99 USD
SKU: NI6Tyl2t
Brand: Unbranded
GTIN: Does not apply
Condition: New
Tags: 2 in / 4 in / 6 in 2 inch 300nm 4-inch China Oxidized Silicon Wafer Polished SiO2 Silicon Wafer Thermal Oxide Layer Unbranded Unit
Categories: Medical & Lab Equipment, Devices

Specifications

Diameter2 inch
Oxide Thickness300nm
BrandUnbranded
Unit TypeUnit
Wafer TypeOxidized Silicon Wafer
ModelSiO2 Silicon Wafer
Wafer Diameter2 in / 4 in / 6 in
Surface FinishPolished
FeaturesThermal Oxide Layer
Country Of OriginChina

The wafer is made with asilicon dioxide thermal oxide layer on a polished silicon wafer substrate. It can be used as aSiO2 silicon wafer ,silicon dioxide wafer ,thermal oxide wafer ,oxidized silicon wafer, orpolished semiconductor substrate for compatible laboratory and research projects.

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