Premium SiO2 Thermal Oxide Silicon Wafers. Coating Type Thermal Oxide (SiO2 ). These substrates feature excellent dielectric properties and superior thickness uniformity. Substrate Material High-Purity Monocrystalline Silicon.
SiO2 Silicon Wafer Thermal Oxide Layer Polished Semiconductor Substrate
The wafer is made with asilicon dioxide thermal oxide layer on a polished silicon wafer substrate. It can be used as aSiO2 silicon wafer ,silicon dioxide wafer ,thermal oxide wafer ,oxidized silicon wafer, orpolished semiconductor substrate for compatible laboratory and research projects.
SiO2 Thermal Oxide Silicon Wafer 2 4 6 Inch Silicon Dioxide Substrate
Research Use ：Can be used as SiO2 substrate, silicon dioxide wafer, oxidized silicon wafer, or lab sample wafer. The wafer is made with asilicon dioxide thermal oxide layer on a polished silicon wafer substrate.
